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Molybdenum Sputtering Target

Molybdenum Sputtering Target

1.Molybdenum sputtering target is a high purity molybdenum metal material used as a sputtering source in various film preparation fields. The purity of molybdenum metal sputtering target is generally required to reach more than 99.95% to ensure the quality and purity requirements of the prepared film.
2.Melting point:2620℃
3.Surface:polished
4.Shape:customized
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Products Description

 

High purity: the general requirement of purity of 99.95% or more, can be customized according to customer needs of higher purity molybdenum sputtering target.

Good processability: molybdenum is easy to process into different shapes of the target, such as plate shape, rotary cylinder shape, square and so on.

Good wear resistance: molybdenum high hardness, heat resistance and corrosion resistance, not easy to deform, so Molybdenum target can maintain a long-term stable sputtering effect.

Easy to clean: Because the chemical properties of the Molybdenum target itself are more stable, it is easy to clean during operation and reduce impurity pollution.

Customizable: The specifications, size and shape of Molybdenum target can be customized according to the different needs of customers to meet the requirements of different preparation processes.

 

Product Parameters

 

 

Material

Pure molybdenum 99.95%

Specifications

Molybdenum target material can be processed according to customer requirements

Application field

1, vacuum coating 2, glass industry

 

 

Picture Details Display

 

 

Molybdenum Sputtering Target process
Molybdenum Sputtering Target in stock

 

Molybdenum Sputtering Target price
Molybdenum Sputtering Target For Sale

 

 

Product Application

 

Molybdenum sputtering target is an important material with a wide range of applications.

Molybdenum sputtering target is mainly used in electronic components, solar cells, touch screens, nanomaterials, etc. Specifically, Molybdenum sputtering target is used for electronic components due to its excellent insulation, thermal conductivity and corrosion resistance, helping to improve the performance and reliability of devices. Molybdenum sputtering target is also a key material for making solar cells, acting as a back electrode in solar cells. In addition, it is used in touch screens to achieve high-definition and high-sensitivity touch effects, widely used in tablet pcs, smartphones, electronic books, etc., bringing users more convenient operation experience. Furthermore, molybdenum sputtering target-made nanomaterials can be widely used in biomedicine, chemical catalysis, electrochemical energy storage, etc. For instance, molybdenum nanofilms can be used as biosensors to improve the sensitivity and specificity of biological detection. As an important material in modern high-tech fields, molybdenum sputtering target is developing towards functional, high performance and environmental protection, driving the process of innovative science and technology.

 

Production Process

 

Molybdenum processing workpiece production flow chart

 

FAQ

 

Q: What is molybdenum sputtering target?

A: Molybdenum sputtering target is the material used in the process of physical vapor deposition (PVD) to produce thin films of molybdenum on a substrate. It is a solid piece of pure molybdenum that is shaped into the desired form for use in a sputtering machine.

Q: How is Molybdenum target produced?

A: Molybdenum sputtering target is produced through a complex process that involves multiple steps, including melting, casting, forging, machining, and polishing. The initial step involves using a vacuum induction furnace to melt raw molybdenum and casting it into a mold. The resulting ingot is then subjected to multiple rounds of forging, machining, and polishing to create the final sputtering target.

Q: What are the benefits of using Molybdenum target?

A: Molybdenum sputtering target offers a number of benefits for PVD applications, including excellent thermal and electrical conductivity, high melting point, corrosion resistance, and low sputtering rate. It is also highly pure and uniform, which leads to consistent film deposition.

Q: What industries use molybdenum  target?

A: Molybdenum sputtering target is used in a wide range of industries, from semiconductor to photovoltaic to architecture. It is particularly important in the production of electronic devices, such as computer chips, LED lights, and solar cells.

Q: How can I ensure the quality of molybdenum target?

A: To ensure the quality of molybdenum sputtering target, it is important to choose a reliable manufacturer that uses high-quality raw materials and strict quality control procedures. In addition, it is important to handle and store the target properly to prevent damage and contamination. Finally, regular inspections and testing can help identify any issues and ensure optimal performance.
contact us

Tel : +86 15596885501 Lisa Yang

+86 18700703333 Elsa lin

 

FAX : 0917-3381186

 

Email : lisayang@ehisen-anode.com

admin@ehisen-anode.com

Add: No. 28, Gaoya Industrial Park, Gaoxin District, Baoji City, Shaanxi Province

20231211150808

 

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